The conference, scheduled for May 5th-7th, 2027, in Shijiazhuang, China, will focus on the latest research in the field of “Industrial Photonics for Precision Manufacturing.” It aims to build a face-to-face platform for experts, scholars and engineering technicians from universities, research institutes, enterprises and public institutions at home and abroad to exchange experience and present the latest research findings. Through academic exchanges and technical paper publications, participants can showcase state-of-the-art scientific achievements, share research insights, explore cooperation opportunities and advance the development of scientific research.


All papers related to the theme of Industrial Photonics for Precision Manufacturing etc. can be submitted, including but not limited to the following topics:

Core Functional Components and Systems for Precision Manufacturing

  • High-energy Beam Generation and Regulation Modules

  • High-sensitivity Imaging and Sensing Units

  • Micro-nano Functional Devices and Integrated Chips

  • Equipment System Integration and Reliability Technology

Precision Special Machining Processes and Equipment

  • Precision Special Material Removal and Joining Processes

  • Micro-nano Manufacturing and Additive Manufacturing Technologies

  • EUV (Extreme Ultraviolet) and DUV (Deep Ultraviolet) Lithography Technologies

  • Surface Modification and Functionalization Machining

  • High-end Special Machining Equipment and Numerical Control Technology

Metrology and Quality Inspection in Manufacturing Processes

  • Precision Measurement of 3D Morphology and Geometric Parameters

  • Multimodal Imaging-based Non-destructive Testing

  • Industrial Vision Perception and Intelligent Inspection

  • Large-scale Spatial Measurement and Distributed Monitoring

  • In-process Workpiece Defect Detection and Quality Evaluation

Precision Manufacturing Technologies and Applications in Key Fields

  • IC (Integrated Circuit) Manufacturing Processes and Inspection

  • Precision Manufacturing of High-end Aerospace Equipment

  • Precision Manufacturing Technologies for New Energy Equipment

  • Precision Fabrication and Inspection of Biomedical Devices

  • Ultra-precision Optical Component Manufacturing and Testing



Important Dates

Last date for paper submission: January 8th, 2027

Last date for paper acceptance: March 5th, 2027

Final Paper Submission Deadline: April 2nd, 2027

Publication

All accepted and registered papers will be published in International Conference Proceedings, which will be sent to EI Compendex and Scopus for indexing.

Submission Guidelines

All submissions should be in English and range from 4 to 8 pages, including figures and references, and should be formatted according to the template, which will be sent to you upon acceptance.

Please submit your paper via email to xueshu@eept.org.cn  .

Authors should complete their submissions before the designated deadlines. Late submissions will not be considered. The initial and final submissions must be in an editable format. Hardcopy is not accepted.

The latest information can be found on the conference website.

Review Instruction

CIPPM 2027 follows the highest standards of publication ethics and takes all possible procedures against any publication misconduct. This Conference does not accept any type of plagiarism, which means that any author replicating a significant part of another's work without acknowledging him/her or passing another's work off as his/her own is not tolerated and not published.

All authors submitting their works to CIPPM 2027 for publication as original works confirm that the submitted papers are their own contributions and have not been copied in whole or in part from other works.

Each submission is anonymously reviewed by an average of three independent reviewers, to ensure the final high standard and quality of each accepted submission. The CIPPM 2027 guarantees that the entire peer review and publication process is meticulous and objective. Furthermore, all works not in accordance with these standards will be removed from the publication if malpractice is revealed at any time even after the publication. Every case of suspected plagiarism or duplicate publishing will be reported.